Applications - Film Thickness Measurement, Plasma Emission Measurement

Home About Us Products Applications *Film Thickness Measurement* Method Principles Schematic Gauge Setup Example: Lacquer Coatings Example: Vapor Deposition Example: Webcoater Plasma Emission Measurement Schematic Gauge Setup Brochures Contact Form International

	These pages (please select on the left side) explain our film thickness measurement technology using the white-light interference phenomenon. Our FTM-Lite and TranSpec film thickness gauges distinguish from all others because of: Non-contact and non-destructive measurement Non-radiation optical method using white light Fast measurement and evaluation - within milliseconds! Wide thickness range: ~ 0.1 - 150 ľm ( 0.004 to 6 mil ) High accuracy - typically better ą 0.005 ľm Simultaneous determination of double-layers possible Motion bridge controlled measurement on webcoaters possible Measurement on very small spots using our FTM-Micro film thickness microscope Application note - Film Thickness Measurement

	An objectively and continuously process control of low-pressure plasma deposition techniques, such as PVD (Physical Vapor Deposition), is one of the real issues today. Aside from a visual examination of the plasma's light emission, sometimes the mass spectroscopy technique is used. Specially the mass spectroscopy is neither handy to operate nor the results are easy to interpret. Compared with this, the benefits of using the OES (Optical Emission Spectroscopy) and our fiber optics coupled TranSpec Spectrometers are obvious: Simultaneous measurement in the spectral range 200...1000 nm Detection of even very low emission intensities Connectable to every vacuum chamber using a special flange Maintenance-free technology Comfortable and easy-to-use software PEM-ProVis Professional Application note - Plasma Emission Measurement